Low density materials can control plasma properties of laser absorption, which can enhance quantum beam generation. The recent practical extreme ultraviolet light (EUV) is the first industrial example of laser plasma source with low density targets. Here we propose an easy-handling target source based on a hollow sub-millimeter microcapsule fabricated from polyelectrolyte cationic and anionic surfactant on air bubbles. The lightweight microcapsules acted as a scaffold for surface coating by tin (IV) oxide nanoparticles (22-48%), and then dried. As a proof of concept study, the microcapsules were ablated with a Nd:YAG laser (7.1 × 1010 W/cm2, 1 ns) to generate 13.5 nm EUV relatively directed to laser incidence. The laser conversion efficiency (CE) at 13.5 nm 2% bandwidth from the tin-coated microcapsule (0.8%) was competitive compared with bulk tin (1%). We propose that microcapsule aggregates could be utilized as a potential small scale/compact EUV source, and future quantum beam sources by changing the coating to other elements.

译文

低密度材料可以控制激光吸收的等离子体特性,从而可以增强量子束的产生。最近实用的极紫外光 (EUV) 是具有低密度目标的激光等离子体源的第一个工业示例。在这里,我们提出了一种易于处理的目标源,该源基于由聚电解质阳离子和阴离子表面活性剂在气泡上制成的空心亚毫米微胶囊。轻质微胶囊用作通过氧化锡 (IV) 纳米颗粒 (22-48%) 进行表面涂覆的支架,然后干燥。作为概念研究的证明,用Nd:YAG激光 (7.1  ×   1010  W/cm2,1  ns) 烧蚀微胶囊,以产生相对针对激光入射的13.5 nm nm EUV。与块状锡 (1%) 相比,来自锡包被的微胶囊 (0.8%) 在13.5  nm 2% 带宽下的激光转换效率 (CE) 具有竞争力。我们建议通过将涂层更改为其他元素,可以将微胶囊聚集体用作潜在的小规模/紧凑型EUV源和未来的量子束源。

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